Photo-catalytic film deposition by atmospheric TPCVD-Reference-Cited by-同舟云学术

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Photo-catalytic film deposition by atmospheric TPCVD

Published:2006-09 Issue:11-12 Volume:80 Page:1278-1283
ISSN:0042-207X
Container-title:Vacuum
language:en
Short-container-title:Vacuum

Author:

Ando Yasutaka,Tobe Shogo,Tahara Hirokazu

Publisher

Elsevier BV

Subject

Surfaces, Coatings and Films,Condensed Matter Physics,Instrumentation

Reference6 articles.

1. Davis, JA, Sproul, WD, Christie, DJ, Geisler, M. 47th Annual technical conference proceedings; 2004. p. 215.

2. Influence of the growth parameters on TiO2 thin films deposited using the MOCVD method

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