Evolution of etch profile of copper thin films in high density plasmas of alcohol-based gases-Reference-Cited by-同舟云学术

登录注册会员服务联系我们

Evolution of etch profile of copper thin films in high density plasmas of alcohol-based gases

Published:2019-09 Issue: Volume:167 Page:145-151
ISSN:0042-207X
Container-title:Vacuum
language:en
Short-container-title:Vacuum

Author:

Lim Eun Taek,Ryu Jin Su,Choi Jae Sang,Chung Chee Won

Funder

MOTIE (Ministry of Trade, Industry & Energy

KSRC

Inha University Research Grant

Publisher

Elsevier BV

Subject

Surfaces, Coatings and Films,Condensed Matter Physics,Instrumentation

Reference20 articles.

1. Chlorine Plasma/Copper Reaction in a New Copper Dry Etching Process

2. Low-Temperature Etching of Cu by Hydrogen-Based Plasmas

3. Plasma etching of copper films at low temperature

4. Reactive Ion Etching Mechanism of Copper Film in Chlorine-based Electron Cyclotron Resonance Plasma

5. Low-temperature dry etching of copper using a new chemical approach

Cited by 14 articles. 订阅此论文施引文献订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献

1. Influence of an etch mask on the etch profile of copper thin films in propanol/Ar gas mixture;Materials Science in Semiconductor Processing;2025-01

2. Two-Step Cyclic Etching of Copper Thin Films Using Acetylacetone/O₂ Gases;ECS Journal of Solid State Science and Technology;2023-07-01

3. Development of a Plasma Etching Process of Copper for the Microfabrication of High-Density Interconnects in Advanced Packaging;2023 IEEE 73rd Electronic Components and Technology Conference (ECTC);2023-05

4. Effect of the addition of O2 on copper etching using high density plasma of acetylacetonate/Ar;Materials Science in Semiconductor Processing;2022-12

5. Development of a Lightweight LTO/Cu Electrode as a Flexible Anode via Etching Process for Lithium-Ion Batteries;ACS Omega;2022-03-17

同舟云学术

1.学者识别学者识别

2.学术分析学术分析

3.人才评估人才评估

"同舟云学术"是以全球学者为主线，采集、加工和组织学术论文而形成的新型学术文献查询和分析系统，可以对全球学者进行文献检索和人才价值评估。用户可以通过关注某些学科领域的顶尖人物而持续追踪该领域的学科进展和研究前沿。经过近期的数据扩容，当前同舟云学术共收录了国内外主流学术期刊6万余种，收集的期刊论文及会议论文总量共计约1.5亿篇，并以每天添加12000余篇中外论文的速度递增。我们也可以为用户提供个性化、定制化的学者数据。欢迎来电咨询！咨询电话：010-8811{复制后删除}0370

www.globalauthorid.com

TOP

Copyright © 2019-2024 北京同舟云网络信息技术有限公司
京公网安备11010802033243号京ICP备18003416号-3