Operation of an electron beam initiated metallic plasma capillary discharge-Reference-Cited by-同舟云学术

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Operation of an electron beam initiated metallic plasma capillary discharge

Published:2014-05 Issue: Volume:103 Page:38-42
ISSN:0042-207X
Container-title:Vacuum
language:en
Short-container-title:Vacuum

Author:

Chan L.S.,Tan D.,Saboohi S.,Yap S.L.,Wong C.S.

Publisher

Elsevier BV

Subject

Surfaces, Coatings and Films,Condensed Matter Physics,Instrumentation

Reference25 articles.

1. In-band EUV radiation of ablative capillary discharge in PVC;Andreić;Vacuum,2003

2. Performance of 13.5 nm PVC capillary discharge EUV source;Andreic;Phys Lett A,2005

3. A novel fast capillary discharge system emitting intense EUV radiation possible source for EUV lithography;Mohanty;Microelectron Eng,2003

4. EUV source using Xe and Sn discharge plasma;Borisov;J Phys D Appl Phys,2004

5. A comparative study on the performance of a Xenon capillary Z-pinch EUV lithography light source using a pinhole camera;Song;Plasma Sour Sci Technol,2006

Cited by 1 articles. 订阅此论文施引文献订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献

1. Some Examples of Small Plasma Devices;Elements of Plasma Technology;2015-12-25

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