Electrical stress probing recovery efficiency of 28 nm HK/MG nMOSFETs using decoupled plasma nitridation treatment

Author:

Wang Shea-Jue,Sung Shun-Ping,Wang Mu-ChunORCID,Huang Heng-Sheng,Chen Shuang-Yuan,Fan Shou-Kong

Publisher

Elsevier BV

Subject

Surfaces, Coatings and Films,Condensed Matter Physics,Instrumentation

Reference33 articles.

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