Effect of the oxygen fraction on the structure and optical properties of HfOxNy thin films
Author:
Publisher
Elsevier BV
Subject
Surfaces, Coatings and Films,Condensed Matter Physics,Instrumentation
Reference16 articles.
1. Metal oxynitride and diamond hard coatings for infrared windows
2. Structural stability of decorative ZrNxOy thin films
3. Impact of post-deposition-annealing on the electrical characteristics of HfOxNy gate dielectric on Ge substrate
4. Improved electrical and surface characteristics of metal-oxide-semiconductor device with gate hafnium oxynitride by chemical dry etching
5. Property change in ZrNxOy thin films: effect of the oxygen fraction and bias voltage
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