Optical and chemical characterization of thin TiNx films deposited by DC-magnetron sputtering-Reference-Cited by-同舟云学术

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Optical and chemical characterization of thin TiNx films deposited by DC-magnetron sputtering

Published:2008-06 Issue:10 Volume:82 Page:1115-1119
ISSN:0042-207X
Container-title:Vacuum
language:en
Short-container-title:Vacuum

Author:

Wrehde Stefan,Quaas Marion,Bogdanowicz Robert,Steffen Hartmut,Wulff Harm,Hippler Rainer

Publisher

Elsevier BV

Subject

Surfaces, Coatings and Films,Condensed Matter Physics,Instrumentation

Reference17 articles.

1. A study on biocompatibility of TiN thin films deposited by dual-energy ion beam assisted deposition

2. Determination of the optimum TiN coating thickness on WC inserts for machining carbon steels

3. Correlation between microstructure and barrier properties of TiN thin films used Cu interconnects

4. TiNx layer as an antireflection and antistatic coating for display

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1. Design and realization of neutral-tinted low-E film;Vacuum;2022-09

2. Detailed phisyco-chemical characterization of the multilayered thin films based on titanium oxynitride and copper doped titanium nitride obtained by different PVD techniques;Vacuum;2022-01

3. Polarization-dependent optical absorption in phosphorene flakes;Low-Dimensional Materials and Devices 2019;2019-09-09

4. Sputter deposition of Titanium and Nickel thin films in radio frequency magnetron discharge characterized by optical emission spectroscopy and by Rutherford backscattering spectrometry;Thin Solid Films;2017-05

5. Investigation of localized surface plasmon resonance of TiN nanoparticles in TiN_xO_y thin films;Optical Materials Express;2016-06-30

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