Effect of annealing temperature on characteristics of Ni49Fe51 films sputter deposited on SiO2/Si (100)
Author:
Publisher
Elsevier BV
Subject
Surfaces, Coatings and Films,Condensed Matter Physics,Instrumentation
Reference14 articles.
1. Improvement of the magnetic characteristics of multilayered Ni-Fe thin films by applying external in-plane field during sputtering
2. Growth structure and properties of Fe rich Fe-Ni alloy films deposited on MgO(001) by d.c.-biased plasma-sputtering
3. Transition of the anisotropic magnetoresistance of permalloy films from the negative to the positive along with thickness
4. Oblique-incidence anisotropy in very thin Ni-Fe films
5. Sputter deposition of 45% Ni-55% Fe for high moment top pole applications
Cited by 3 articles. 订阅此论文施引文献 订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献
1. The porous silicon morphology effect on the growth of electrodeposited FeNi alloy;Journal of Physics and Chemistry of Solids;2012-03
2. Electrodeposition of NiFe films on Si(100) substrate;Surface Science;2007-09
3. FexNi100−x nanometric films deposited by laser ablation on SiO2/Si substrates;Applied Surface Science;2007-05
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