Characterization and electrochemical behavior of a multilayer-structured Ti–N layer produced by plasma nitriding of electron beam melting TC4 alloy in Hank's solution-Reference-Cited by-同舟云学术

Characterization and electrochemical behavior of a multilayer-structured Ti–N layer produced by plasma nitriding of electron beam melting TC4 alloy in Hank's solution

Published:2023-02 Issue: Volume:208 Page:111737
ISSN:0042-207X
Container-title:Vacuum
language:en
Short-container-title:Vacuum

Author:

Li Yang^ORCID,Wang Zhengwei,Shao Minghao,Zhang Zhehao,Wang Chengxu,Yan Jiwen,Lu Jinpeng,Zhang Lei,Xie Bing,He Yongyong,Qiu J.X.

Funder

National Natural Science Foundation of China

Publisher

Elsevier BV

Subject

Surfaces, Coatings and Films,Condensed Matter Physics,Instrumentation

Reference54 articles.

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