Effect of temperature on composition evolution of oxide film on Al–Mg–Sc alloy
Author:
Publisher
Elsevier BV
Subject
Surfaces, Coatings and Films,Condensed Matter Physics,Instrumentation
Reference23 articles.
1. Structure and morphology of aluminium-oxide films formed by thermal oxidation of aluminium;Jeurgens;Thin Solid Films,2002
2. Thermal oxidation of single-crystal aluminum at 550°C;Eldridge;Oxid. Metals,1988
3. Influence of severe plastic deformation on dynamic strain aging of ultrafine grained Al–Mg alloys;Zhao;Acta Mater.,2014
4. Effects of high Mg content and processing parameters on Portevin-Le Chatelier and negative strain rate sensitivity effects in Al–Mg alloys;Cho;Mater. Sci. Eng. A,2020
5. Probing the initial stage of synthesis of Al2O3/Al composites by directed oxidation of Al-Mg alloys;Venugopalan;Metall. Mater. Trans. B,1996
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