Comparison of silicon epitaxial growth on the 200- and 300-mm wafers from trichlorosilane in Centura reactors-Reference-Cited by-同舟云学术

登录注册会员服务联系我们

Comparison of silicon epitaxial growth on the 200- and 300-mm wafers from trichlorosilane in Centura reactors

Published:2001-05 Issue:1-2 Volume:56 Page:93-98
ISSN:0167-9317
Container-title:Microelectronic Engineering
language:en
Short-container-title:Microelectronic Engineering

Author:

Segal A.S.,Galyukov A.O.,Kondratyev A.V.,Sid’ko A.P.,Karpov S.Yu.,Makarov Yu.N.,Siebert W.,Storck P.

Publisher

Elsevier BV

Subject

Electrical and Electronic Engineering,Surfaces, Coatings and Films,Condensed Matter Physics,Atomic and Molecular Physics, and Optics,Electronic, Optical and Magnetic Materials

Reference4 articles.

1. The role of gaseous species in group-III nitride growth

2. A kinetics and transport model of dichlorosilane chemical vapor deposition

3. Modeling the GAS-Phase Chemistry of Silicon Carbide Formation

4. Adsorption and desorption kinetics for SiH2Cl2 on Si(111) 7×7

Cited by 4 articles. 订阅此论文施引文献订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献

1. Transport Phenomena in Vapor Phase Epitaxy Reactors;Handbook of Crystal Growth;2015

2. Convection-assisted chemical vapor deposition (CoCVD) of silicon on large-area substrates;Journal of Crystal Growth;2008-03

3. Computational Analysis and Optimization of a Chemical Vapor Deposition Reactor with Large-Scale Computing;Industrial & Engineering Chemistry Research;2004-04-17

4. Die Herstellung von Reinstsiliciumscheiben: Mehr Chemie als man glaubt;Chemie in unserer Zeit;2003-06

同舟云学术

1.学者识别学者识别

2.学术分析学术分析

3.人才评估人才评估

"同舟云学术"是以全球学者为主线，采集、加工和组织学术论文而形成的新型学术文献查询和分析系统，可以对全球学者进行文献检索和人才价值评估。用户可以通过关注某些学科领域的顶尖人物而持续追踪该领域的学科进展和研究前沿。经过近期的数据扩容，当前同舟云学术共收录了国内外主流学术期刊6万余种，收集的期刊论文及会议论文总量共计约1.5亿篇，并以每天添加12000余篇中外论文的速度递增。我们也可以为用户提供个性化、定制化的学者数据。欢迎来电咨询！咨询电话：010-8811{复制后删除}0370

www.globalauthorid.com

TOP