Author:
Yoo Jung-Ho,Nam Seok-Woo,Kang Sung-Kwan,Jeong Yun-Ha,Ko Dae-Hong,Ku Ja-Hum,Lee Hoo-Jeong
Subject
Electrical and Electronic Engineering,Surfaces, Coatings and Films,Condensed Matter Physics,Atomic and Molecular Physics, and Optics,Electronic, Optical and Magnetic Materials
Reference8 articles.
1. Peter M. Zeitzoff, SEMATECH Inc., Austin, TX, USA, Front-End Trends, Challenges, and Potential Solutions for the 180–100 nm IC Technology Generations, Semiconductor Fabtech, 10th Edition, 1999, pp. 275–282.
2. Dielectric Characteristics of Double Layer Structure of Extremely Thin Ta2 O 5 / SiO2 on Si
3. Preparation ofSrBi2Ta2O9Film at Low Temperatures and Fabrication of a Metal/Ferroelectric/Insulator/Semiconductor Field Effect Transistor UsingAl/SrBi2Ta2O9/CeO2/Si(100)Structures
4. Electrical characteristics of epitaxial CeO2on Si(111)
5. Electrical and Structural Properties of Annealed Epitaxial Ceo2 Films on Si(111) Substrates
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