A three dimensional numerical algorithm for predicting temperature rise in resist with arbitrary geometry of pattern during X-ray exposure-Reference-Cited by-同舟云学术

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A three dimensional numerical algorithm for predicting temperature rise in resist with arbitrary geometry of pattern during X-ray exposure

Published:1999-12 Issue:3-4 Volume:49 Page:217-231
ISSN:0167-9317
Container-title:Microelectronic Engineering
language:en
Short-container-title:Microelectronic Engineering

Author:

Dai W.,Zhang Y.,Nassar R.

Publisher

Elsevier BV

Subject

Electrical and Electronic Engineering,Surfaces, Coatings and Films,Condensed Matter Physics,Atomic and Molecular Physics, and Optics,Electronic, Optical and Magnetic Materials

Reference20 articles.

1. Thermal analysis of X-ray irradiated thick resists to determine induced structural deformations;Ameel;Heat Transfer,1994

2. Elementary Linear Algebra;Anton,1994

3. An Introduction to Numerical Analysis;Atkinson,1988

4. Polymer Handbook;Brandup,1989

5. Finite Elements;Carey,1984

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