DUV resists in negative tone high resolution electron beam lithography-Reference-Cited by-同舟云学术

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DUV resists in negative tone high resolution electron beam lithography

Published:1999-05 Issue:1-4 Volume:46 Page:383-387
ISSN:0167-9317
Container-title:Microelectronic Engineering
language:en
Short-container-title:Microelectronic Engineering

Author:

van Delft Falco C.M.J.M.,Holthuysen Frans G.

Publisher

Elsevier BV

Subject

Electrical and Electronic Engineering,Surfaces, Coatings and Films,Condensed Matter Physics,Atomic and Molecular Physics, and Optics,Electronic, Optical and Magnetic Materials

Reference3 articles.

1. Proc. MNE'96;Macintyre,1997

2. Proceedings MNE'94;de Koning,1995

3. E.M.L. Alexander-Moonen (private communication).

Cited by 2 articles. 订阅此论文施引文献订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献

1. Fullerene (C60) and its Derivatives as Resists for Electron Beam Lithography;Advanced Structured Materials;2010

2. Resists for Mask Making;Handbook of Photomask Manufacturing Technology;2005-04-07

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