Mathematical modeling of three-dimensional kinetically-limited laser chemical vapor deposition-Reference-Cited by-同舟云学术

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Mathematical modeling of three-dimensional kinetically-limited laser chemical vapor deposition

Published:2002-04 Issue:3-4 Volume:60 Page:395-408
ISSN:0167-9317
Container-title:Microelectronic Engineering
language:en
Short-container-title:Microelectronic Engineering

Author:

Nassar R.,Zhang C.,Dai W.,Lan H.,Maxwell J.

Publisher

Elsevier BV

Subject

Electrical and Electronic Engineering,Surfaces, Coatings and Films,Condensed Matter Physics,Atomic and Molecular Physics, and Optics,Electronic, Optical and Magnetic Materials

Reference13 articles.

1. Laser chemical vapor deposition for microelectronics;Auvert;Appl. Surf. Sci.,1995

2. Laser-induced chemical vapor deposition;Bauerle,1984

3. J. Maxwell, Three-dimensional laser-induced pyrolytic modeling, growth rate control, and application to microscale prototyping, Ph.D. Thesis, Rensselaer Polytechnic Institute, Troy, New York, 1996.

4. Truly three-dimensional structures microfabricated by laser chemical vapor deposition;Westberg,1992

5. Simulation of growth in pyrolytic laser-CVD of microstructures. I. one-dimensional approach;Arnold;Microelectron. Eng.,1993

Cited by 2 articles. 订阅此论文施引文献订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献

1. Mathematical model for simulating axisymmetric rod growth with kinetically limited and mass transport limited rates;SPIE Proceedings;2003-01-25

2. Inverse model for optimizing the process of fabricating a microstructure by Laser Chemical Vapor Deposition;SPIE Proceedings;2003-01-25

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