Author:
Cotte E.P.,Lovell E.G.,Engelstad R.L.
Subject
Electrical and Electronic Engineering,Surfaces, Coatings and Films,Condensed Matter Physics,Atomic and Molecular Physics, and Optics,Electronic, Optical and Magnetic Materials
Reference6 articles.
1. Prediction of in-plane distortions due to mask fabrication processes;Laudon;Microelectron. Eng.,1997
2. Pattern placement errors in mask membranes;Fisher;J Vac. Sci. Technol. B,1997
3. Pattern Transfer on Mask Membranes;Fisher;J Vac. Sci. Technol. B,1998
4. A. Fisher, Analysis and Simulation of Pattern Placement Errors in Advanced Lithographic Masks, Ph.D. Thesis, Department of Mechanical Engineering, University of Wisconsin, 1998.
5. E. Cotte, R. Engelstad, E. Lovell, C. Brooks, Predicting Mechanical Distortions in X-ray Masks, Proceedings of the 1999 SPIE Symposium on Emerging Lithographic Technologies III, 3676 (1999) 429–440.
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