Low-cost X-ray conformal mask using dry film resist-Reference-Cited by-同舟云学术

Low-cost X-ray conformal mask using dry film resist

Published:1998-02 Issue:1 Volume:40 Page:43-50
ISSN:0167-9317
Container-title:Microelectronic Engineering
language:en
Short-container-title:Microelectronic Engineering

Author:

Shih W.-P,Cheng Y,Lin C.-Y,Hwang G.-J

Publisher

Elsevier BV

Subject

Electrical and Electronic Engineering,Surfaces, Coatings and Films,Condensed Matter Physics,Atomic and Molecular Physics, and Optics,Electronic, Optical and Magnetic Materials

Reference10 articles.

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2. Three-dimensional microfabrication using synchrotron radiation;Ehrfeld;Nucl. Instr. and Meth. A,1991

3. Masks for high aspect ratio X-Ray lithography;Khan Malek;J. Micromech. Microengrg.,1996

4. K. Suzuki, S. Sugiyama, Silicon IC compatible LIGA mask fabrication process, HARMST '97, Madison, WI, June 20–21, 1997.

5. Aligned double exposure in deep X-ray lithography;Schmidt;Microelectron. Engrg.,1996

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