Investigation of mask pattern proximity correction to reduce image shortening in X-ray lithography
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Published:1998-03
Issue:
Volume:41-42
Page:271-274
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ISSN:0167-9317
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Container-title:Microelectronic Engineering
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language:en
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Short-container-title:Microelectronic Engineering
Author:
Hector Scott,Pol Victor,Khan Mumit,Bollepalli Srinivas,Cerrina Franco
Subject
Electrical and Electronic Engineering,Surfaces, Coatings and Films,Condensed Matter Physics,Atomic and Molecular Physics, and Optics,Electronic, Optical and Magnetic Materials
Reference5 articles.
1. Microprocess Conf.;Kikuchi,1997