Author:
van Delft Falco C.M.J.M.,Giesbers J.Ben
Subject
Electrical and Electronic Engineering,Surfaces, Coatings and Films,Condensed Matter Physics,Atomic and Molecular Physics, and Optics,Electronic, Optical and Magnetic Materials
Reference13 articles.
1. The etch mechanisms of magnetic materials in an HCl plasma
2. IUPAP proc. Intl. Conf. on Magnetism;van Delft,1995
3. proc. MNE'95;van Delft,1996
Cited by
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