Optimisation of doped microcrystalline silicon films deposited at very low temperatures by hot-wire CVD-Reference-Cited by-同舟云学术

Optimisation of doped microcrystalline silicon films deposited at very low temperatures by hot-wire CVD

Published:2000-01 Issue: Volume:69-70 Page:278-283
ISSN:0921-5107
Container-title:Materials Science and Engineering: B
language:en
Short-container-title:Materials Science and Engineering: B

Author:

Voz C,Peiró D,Bertomeu J,Soler D,Fonrodona M,Andreu J

Publisher

Elsevier BV

Subject

Mechanical Engineering,Mechanics of Materials,Condensed Matter Physics,General Materials Science

Reference12 articles.

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