Fabrication and characterisation of ultra sharp silicon field emitters-Reference-Cited by-同舟云学术

Fabrication and characterisation of ultra sharp silicon field emitters

Published:1998-02 Issue:1-3 Volume:51 Page:150-153
ISSN:0921-5107
Container-title:Materials Science and Engineering: B
language:en
Short-container-title:Materials Science and Engineering: B

Author:

Huq S.E,Grayer G.H,Moon S.W,Prewett P.D

Publisher

Elsevier BV

Subject

Mechanical Engineering,Mechanics of Materials,Condensed Matter Physics,General Materials Science

Reference6 articles.

1. Oxidized amorphous silicon as gate insulator for silicon tips

2. Silicon field emitter arrays with low capacitance and improved transconductance for microwave amplifier applications

3. Physical properties of thin‐film field emission cathodes with molybdenum cones

4. Sub10nm silicon field emitters produced by electron beam lithography and isotropic plasma etching

5. 100 kV thermal field emission electron beam lithography tool for high-resolution x-ray mask patterning

Cited by 12 articles. 订阅此论文施引文献订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献

1. Porous Silicon and Cold Cathodes;Porous Silicon: From Formation to Applications: Optoelectronics, Microelectronics, and Energy Technology Applications, Volume Three;2016-01-07

2. Diamond-like carbon decoration enhances the field electron emission of silicon nanowires;Surface and Coatings Technology;2013-08

3. FABRICATION AND CHARACTERISTICS OF SILICON MICRO-TIP ARRAYS;International Journal of Modern Physics B;2010-11-10

4. Novel cold cathode materials and applications;Materials Science and Engineering: R: Reports;2005-01

5. Optimization of Micromachined Reflex Klystrons for Operation at Terahertz Frequencies;IEEE Transactions on Microwave Theory and Techniques;2004-10