Microstructure of indium tin oxide films deposited on porous silicon by rf-sputtering
Author:
Publisher
Elsevier BV
Subject
Mechanical Engineering,Mechanics of Materials,Condensed Matter Physics,General Materials Science
Reference36 articles.
1. Effect of target‐substrate distance on the growth and properties of rf‐sputtered indium tin oxide films
2. Low resistivity indium–tin oxide transparent conductive films. I. Effect of introducing H2O gas or H2 gas during direct current magnetron sputtering
3. Thin Film Solar Cells;Chopra,1983
4. AlGaInP LEDs using reactive thermally evaporated transparent conducting indium tin oxide (ITO)
5. The influence of the concentration of Er3+ ions on the characteristics of AC-electroluminescence in ZnS:ErF3 thin films
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