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Low energy plasma enhanced chemical vapor deposition

Published:2002-02 Issue:1-3 Volume:89 Page:288-295
ISSN:0921-5107
Container-title:Materials Science and Engineering: B
language:en
Short-container-title:Materials Science and Engineering: B

Author:

Kummer M,Rosenblad C,Dommann A,Hackbarth T,Höck G,Zeuner M,Müller E,von Känel H

Publisher

Elsevier BV

Subject

Mechanical Engineering,Mechanics of Materials,Condensed Matter Physics,General Materials Science

Reference24 articles.

1. Silicon epitaxy by low-energy plasma enhanced chemical vapor deposition

2. Hydrogen plasma chemical cleaning of metallic substrates and silicon wafers

3. Device quality of in situ plasma cleaning for silicon molecular beam epitaxy

4. Epitaxial growth at high rates with LEPECVD

5. Low temperature epitaxial growth by LEPECVD

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5. Correlation of Impedance Matching and Optical Emission Spectroscopy during Plasma-Enhanced Chemical Vapor Deposition of Nanocrystalline Silicon Thin Films;Coatings;2019-05-06

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