Positive ionization and electron attachment of hexafluoropropylene oxide in different cluster environments-Reference-Cited by-同舟云学术

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Positive ionization and electron attachment of hexafluoropropylene oxide in different cluster environments

Published:2019-01 Issue: Volume:435 Page:145-150
ISSN:1387-3806
Container-title:International Journal of Mass Spectrometry
language:en
Short-container-title:International Journal of Mass Spectrometry

Author:

Pysanenko Andriy,Kollárová Dominika,Fedor Juraj,Kočišek Jaroslav,Fárník Michal

Funder

Czech Science Foundation

Praemium Academiae of the Czech Academy of Sciences

Publisher

Elsevier BV

Subject

Physical and Theoretical Chemistry,Spectroscopy,Condensed Matter Physics,Instrumentation

Reference33 articles.

1. Plasma deposition of optical films and coatings: A review

2. Fluorinated amorphous carbon thin films grown by plasma enhanced chemical vapor deposition for low dielectric constant interlayer dielectrics

3. Pulsed plasma enhanced and hot filament chemical vapor deposition of fluorocarbon films

4. Time resolved ultraviolet absorption spectroscopy of pulsed fluorocarbon plasmas

5. Fluorocarbon thin film with superhydrophobic property prepared by pyrolysis of hexafluoropropylene oxide

Cited by 1 articles. 订阅此论文施引文献订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献

1. Ion and radical chemistry in (H2O2)N clusters;Physical Chemistry Chemical Physics;2020

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