Residual stress measurement in PVD optical coatings by microtopography
Author:
Publisher
Elsevier BV
Subject
Applied Mathematics,Electrical and Electronic Engineering,Condensed Matter Physics,Instrumentation
Reference16 articles.
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2. Mechanical integrity in PVD Coatings due to the presence of residual stresses;Teixeira;Thin Solid Films,2001
3. Influence of sputtering power and the substrate–target distance on the properties of ZrO2 films prepared by RF reactive sputtering;Gao;Thin Solid Films,2000
4. Modification of curvature-based thin film residual stress measurement for MEMS applications;Chen;J. Micromech. Microeng.,2002
5. V. Teixeira, M. Andritschky, Residual stress in coatings produced by magnetron. Sputtering, High Temp. High Press. 25 (1993) 213.
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