Determination of dielectric constant and loss of high-K thin films in the microwave frequencies-Reference-Cited by-同舟云学术

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Determination of dielectric constant and loss of high-K thin films in the microwave frequencies

Published:2010-05 Issue:4 Volume:43 Page:556-562
ISSN:0263-2241
Container-title:Measurement
language:en
Short-container-title:Measurement

Author:

Sudheendran K.,Pamu D.,Ghanashyam Krishna M.,James Raju K.C.

Publisher

Elsevier BV

Subject

Applied Mathematics,Electrical and Electronic Engineering,Condensed Matter Physics,Instrumentation

Reference38 articles.

1. Alternative dielectrics to silicon dioxide for memory and logic devices;Kingon;Nature,2000

2. The drive to miniaturization;Peercy;Nature,2000

3. Band offsets of wide band gap oxides and implications for future electronic devices;Robertson;Vac. Sci. Technol.,2000

4. Relative dielectric constant of epitaxial BaTiO3 thin films in the GHz frequency range;Hamno;Appl. Phys. Lett.,2003

5. C. James Booth, R. Leila Valie, H. Ronald Ono, Broadband determination of microwave permittivity and loss in tunable dielectric thin film materials, in: Proceedings of the MRS Meeting Symposium KK, vol. 603, 1999, pp. 1–12.

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