Structural modification of poly (methyl methacrylate) due to electron irradiation

Author:

Tiwari Pragya,Srivastava A.K.,Khattak B.Q.,Verma Suveer,Upadhyay Anuj,Sinha A.K.,Ganguli Tapas,Lodha G.S.,Deb S.K.

Publisher

Elsevier BV

Subject

Applied Mathematics,Electrical and Electronic Engineering,Condensed Matter Physics,Instrumentation

Reference23 articles.

1. Zheng Cui, Micro-Nanofabrication Technologies and Applications, (Springer, 2006) and the Nanofabrication: Principles, Capabilities and Limits, (Springer, 2008); H.J. Levinson, Lithography process control, Tutorial texts in optical engineering SPIE press, vol. TT28., P.R. Choudhury, Handbook of Microlithography, Micromachining, and Microfabrication: Microlithography, SPIE Press, 1997.

2. Handbook of Contamination Control in Microelectronics: Principles, Applications and Technology;Tolliver,1988

3. Nanopatterning of PMMA on insulating surfaces with various anti-charging, schemes using 30keV electron beam lithography;Muhammad;J. Vac. Sci. Technol. B,2011

4. PMMA and Copolymer, Speciality Material, MEMs, Optoelectronics & Prototype Coating Services, Brewer Science, 2003, and NANOTM PMMA and Copolymer Data Sheet, MicroChem Corporation, 2001.

5. Thermal expansion of irradiated PMMA;Subrahmanyam;Polymer,1987

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