New IEC standards for the measurement of sheet resistance on large-area graphene using the van der Pauw and the in-line four-point probe methods-Reference-Cited by-同舟云学术

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New IEC standards for the measurement of sheet resistance on large-area graphene using the van der Pauw and the in-line four-point probe methods

Published:2024-08 Issue: Volume:236 Page:114980
ISSN:0263-2241
Container-title:Measurement
language:en
Short-container-title:Measurement

Author:

Cultrera Alessandro^ORCID,Serazio Danilo,Fabricius Norbert,Callegaro Luca

Funder

European Metrology Programme for Innovation and Research

Horizon 2020

EURAMET European Metrology Programme for Innovation and Research

Publisher

Elsevier BV

Reference27 articles.

1. Electric field effect in atomically thin carbon films;Novoselov;Science,2004

2. Large-area synthesis of high-quality and uniform graphene films on copper foils;Li;Science,2009

3. Research on scalable graphene faces a reproducibility gap;Bøggild;Nature Commun.,2023

4. GRACE: Developing electrical characterisation methods for future graphene electronics;Callegaro,2018

5. IEC TS 62607-6-7:2023, Nanomanufacturing - Key Control Characteristics - Part 6-7: Graphene - Sheet Resistance: van der Pauw Method, IEC, Geneve, Switzerland.

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1. IMEKO TC4 symposium 2023 in Pordenone: Academia meets industry;Measurement;2024-10

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