LiNbO3 exposed to radio-frequency plasma
Author:
Publisher
Elsevier BV
Subject
Instrumentation,Nuclear and High Energy Physics
Reference10 articles.
1. J. Carnera, Electro-optic and Photorefractive Materials, in: P. Gunther (Ed.), Springer, Berlin, 1987, p. 179
2. A low-resistance layer on LiNbO3 produced in hydrogen RF discharge
3. H. Turcicova, J. Vacik, J. Cervena, V. Zelezny, Int. Symp. Optical Systems Design and Production II, in: A.E. Gee, J.-F. Houee (Eds.), Proc. Europto Series, SPIE, Washington, 1996, p. 566
4. M. Konuma, Film Deposition by Plasma Techniques, Springer, Heidelberg, 1992
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3. Surface analysis of LiNbO3 single crystals modified by radiofrequency hydrogen plasma;Surface and Interface Analysis;2000-04
4. Sheet resistance of LiNbO3 wafers processed in radio-frequency plasma of hydrogen;Czechoslovak Journal of Physics;2000-03
5. Li depth profile anomaly after radio-frequency hydrogen plasma processing of single crystal LiNbO3;Ferroelectrics;2000-02
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