Recoil implantation of Si into GaAs by as ion bombardment
Author:
Publisher
Elsevier BV
Subject
Instrumentation,Nuclear and High Energy Physics
Reference15 articles.
1. Proc. Int. Conf. on Ion Implantation in Semiconductors;Moline,1976
2. Proc. Int. Conf. on Ion Implantation in Semiconductors;Ishiwara,1976
3. Recoil implantation of antimony into silicon
4. Recoil implantation of antimony in silicon
5. Recoil implantation of antimony into silicon by argon ion bombardment
Cited by 4 articles. 订阅此论文施引文献 订阅此论文施引文献,注册后可以免费订阅5篇论文的施引文献,订阅后可以查看论文全部施引文献
1. Shallow Doping of Gallium Arsenide by Recoil Implantation;MRS Proceedings;1989
2. Silicide Formation and Thermal Stability of Ni/Si/GaAs Interface;MRS Proceedings;1989
3. Direct and Recoil Implantation, and Collisional Ion-Beam Mixing: Recent Low-Temperature Experiments;Materials Modification by High-fluence Ion Beams;1989
4. Ion Implantation and RTA in III-V Materials;MRS Proceedings;1988
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