An XPS study of the SF6 reactive ion beam etching of silicon at low temperatures
Author:
Publisher
Elsevier BV
Subject
Instrumentation,Nuclear and High Energy Physics
Reference27 articles.
1. Cryogenic reactive ion etching of silicon in SF6
2. Low‐temperature dry etching
3. Low temperature reactive ion etching of silicon with SF[sub 6]/O[sub 2] plasmas
4. Etching of Si at low temperatures using a SF6 reactive ion beam: Effect of the ion energy and current density
5. The reaction of fluorine atoms with silicon
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