Characterization of TiCN coatings deposited by magnetron sputter-ion plating process: RBS and GDOS complementary analyses
Author:
Publisher
Elsevier BV
Subject
Instrumentation,Nuclear and High Energy Physics
Reference14 articles.
1. Residual stresses and residual stress distributions in TiCN- and TiN-coated steels
2. Applications of TiN thin films in silicon device technology
3. Ion-plated titanium carbonitride films
4. Characterization of titanium-aluminum nitride thin films by ion beam techniques and X-ray diffraction
5. Synthesis of TiN/TiCN/TiC layer systems on steel and cermet substrates by PACVD
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1. Relationship between CH4/Ar ratio, stoichiometry, and mechanical properties of TaCx coatings produced by reactive magnetron sputtering;Applied Surface Science;2021-09
2. Analysis of shallow depth profiles of titanium nitride and N-implanted titanium by GD-OES: the ‘hydrogen effect’ after the discharge startup and a correction thereof;Journal of Analytical Atomic Spectrometry;2017
3. Glow Discharge as a Tool for Surface and Interface Analysis;Applied Spectroscopy Reviews;2006-07
4. Characterisation of PVD TiCN layers by physical and electrochemical methods;Surface Engineering;2005-04
5. THE EFFECT OF DEPOSITION PARAMETERS ON THE CHEMICAL COMPOSITION AND CORROSION RESISTANCE OF TIC X N Y COATINGS PRODUCED ON HIGH-SPEED STEEL SUBSTRATES;Brazilian Journal of Chemical Engineering;2001-12
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