Radiation damage and doping by implantation of Ti or Pd ions into TiO2 layers on Ti
Author:
Publisher
Elsevier BV
Subject
General Medicine,General Chemistry,General Medicine
Reference13 articles.
1. Migration of high energy defects after Pd-implantation in oxide films on titanium
2. Electrochemical and Structural Behaviour of Pd+Implanted TiO2-Films in Dependence on the Pd+-Concentration
3. The simulation of radiation damage in oxide films by ion implantation
4. Amorphization and reconstruction of PD-implanted oxide films on titanium
5. Electrochemical investigations of ion-implanted oxide films
Cited by 5 articles. 订阅此论文施引文献 订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献
1. ChemInform Abstract: Radiation Damage and Doping by Implantation of Ti or Pd Ions Into TiO2 Layers on Ti.;ChemInform;2010-08-23
2. Corrosion behavior of hydrophobic titanium oxide film pre-treated in hydrogen peroxide solution;Materials and Corrosion;2010-02-25
3. Challenges in the Surface Analytical Characterisation of Anodic TiO2Films – a Review;Zeitschrift für Physikalische Chemie;2005-11
4. Characterisation and behaviour of Ti/TiO2/noble metal anodes;Electrochimica Acta;2003-04
5. Low-energy implantation and sputtering of TiO2 by nitrogen and argon and the electrochemical reoxidation;Surface and Interface Analysis;1991-09
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