A novel high-accuracy microstereolithography method employing an adaptive electro-optic mask-Reference-Cited by-同舟云学术

A novel high-accuracy microstereolithography method employing an adaptive electro-optic mask

Published:2000-11 Issue:1-3 Volume:107 Page:167-172
ISSN:0924-0136
Container-title:Journal of Materials Processing Technology
language:en
Short-container-title:Journal of Materials Processing Technology

Author:

Farsari M,Claret-Tournier F,Huang S,Chatwin C.R,Budgett D.M,Birch P.M,Young R.C.D,Richardson J.D

Publisher

Elsevier BV

Subject

Industrial and Manufacturing Engineering,Metals and Alloys,Computer Science Applications,Modeling and Simulation,Ceramics and Composites

Reference4 articles.

1. Study of the spatial resolution of a new 3D micro-fabrication process: the microstereophotolithography using a dynamic mask-generator technique;Bertsch;J. Photochem. Photobiol. A,1997

2. MEMS: the maturing of a new technology;Pottenger;Solid State Technol.,1997

3. Holographic characterisation of epoxy resins at 351.1 nm;Farsari;Opt. Eng.,1998

4. P.F. Jacobs, Rapid Prototyping and Manufacturing: Fundamentals of Stereolithography, The Society of Manufacturing Engineers, Dearborn, MI, 1992 (ISBN 0-87263-425-6).

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