On the attainment of optimum developer parameters for PMMA resist-Reference-Cited by-同舟云学术

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On the attainment of optimum developer parameters for PMMA resist

Published:1992-01 Issue:2 Volume:11 Page:237-240
ISSN:0749-6036
Container-title:Superlattices and Microstructures
language:en
Short-container-title:Superlattices and Microstructures

Author:

Bernstein Gary H.,Hill Davide A.

Publisher

Elsevier BV

Subject

Electrical and Electronic Engineering,Condensed Matter Physics,General Materials Science

Reference5 articles.

1. Enhanced sensitivity in the electron beam resist poly(methyl methacrylate) using improved solvent developer

2. Poly(methyl methacrylate): influence of tacticity on its use as an electron resist

3. D. A. Hill and G. H. Bernstein, unpublished.

4. Developer Characteristics of Poly‐(Methyl Methacrylate) Electron Resist

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