1. Semiconductor Silicon Crystal Technology;Shimura,1989
2. The mechanism of swirl defects formation in silicon
3. Hasebe, Y. Takeoka, S. Shinoyama and S. Naito, in K. Sumino (ed.), Proc. Int. Conf. Defect Control in Semiconductors, Yokohama, Japan 1989, North-Holland, Amsterdam, 1990, p. 157.
4. Marsden, S. Sadamitsu, M. Hourai, S. Sumita and T. Shigematsu, in H.R. Huff, W. Bergholz and K. Sumino (eds.), Semiconductor Silicon 1994, Electrochemical Society, Pennington, 1994, Proc. Vol. 94–10, p. 684.
5. A Model for the Formation of Oxidation-Induced Stacking Faults in Czochralski Silicon