1. Soft x-ray reduction lithography using multilayer mirrors;Kinoshita;Journal of Vacuum Science and Technology B,1989
2. Reduction imaging at 14nm using multilayer–coated optics: Printing of features smaller than 0.1μm;Bjorkholm;Journal of Vacuum Science and Technology B,1990
3. “EUVLLC program status and plans” collection of abstracts;Gwyn,2001
4. Development status of EUV sources for use in beta-tools and high-volume chip manufacturing tools;Stamm;Proceedings of SPIE, Emerging Lithographic Technologies X,2006
5. EUV sources for the alpha-tools;Pankert;Proceedings of SPIE,2006