Laser-chemical modification of nucleation barriers for area-selective thin film growth-Reference-Cited by-同舟云学术

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Laser-chemical modification of nucleation barriers for area-selective thin film growth

Published:1984-09 Issue:1 Volume:68 Page:176-187
ISSN:0022-0248
Container-title:Journal of Crystal Growth
language:en
Short-container-title:Journal of Crystal Growth

Author:

Tsao J.Y.,Ehrlich D.J.

Publisher

Elsevier BV

Subject

Materials Chemistry,Inorganic Chemistry,Condensed Matter Physics

Reference16 articles.

1. A review of laser–microchemical processing

2. Laser-Controlled Chemical Processing of Surfaces,1984

3. Technical Digest of the International Electron Devices Meeting;Endo,1982

4. A technique for producing epitaxial films on reuseable substrates

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2. Chemical vapor deposition of aluminum for ulsi applications;Korean Journal of Chemical Engineering;1995-01

3. Mechanistic studies of photoinduced reactions at semiconductor surfaces;Progress in Surface Science;1992-02

4. Surface mechanisms in aluminum chemical vapor deposition;Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films;1991-05

5. Selected Area Processing;Thin Film Processes;1991

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