Growth studies of ferroelectric oxide layers prepared by organometallic chemical vapor deposition-Reference-Cited by-同舟云学术

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Growth studies of ferroelectric oxide layers prepared by organometallic chemical vapor deposition

Published:1991-01 Issue:1-4 Volume:107 Page:712-715
ISSN:0022-0248
Container-title:Journal of Crystal Growth
language:en
Short-container-title:Journal of Crystal Growth

Author:

Wills L.A.,Feil W.A.,Wessels B.W.,Tonge L.M.,Marks T.J.

Publisher

Elsevier BV

Subject

Materials Chemistry,Inorganic Chemistry,Condensed Matter Physics

Reference4 articles.

1. The growth of ferroelectric oxides by MOCVD

2. Characterization of MOCVD PbTiO3thin films

3. Metalorganic chemical vapor deposition of PbTiO3thin films

4. Organometallic chemical vapor deposition of strontium titanate

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