Surface morphology of HCl etched silicon wafers
Author:
Publisher
Elsevier BV
Subject
Materials Chemistry,Inorganic Chemistry,Condensed Matter Physics
Reference20 articles.
1. Gas phase etching of silicon with HCl
2. Growth and etching of silicon in chemical vapour deposition systems; The influence of thermal diffusion and temperature gradient
3. Effects of natural and forced convection in vapor phase growth systems
4. B.J. Curtis and J.P. Dismukes, in: Chemical Vapour Deposition 4th Intern. Conf., p. 218
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