Low-temperature growth of silicon on Si1−xGex by liquid phase epitaxy

Author:

Healy S.A.,Young T.L.,Green M.A.

Publisher

Elsevier BV

Subject

Materials Chemistry,Inorganic Chemistry,Condensed Matter Physics

Cited by 9 articles. 订阅此论文施引文献 订阅此论文施引文献,注册后可以免费订阅5篇论文的施引文献,订阅后可以查看论文全部施引文献

1. Pressure-sensitive liquid phase epitaxy of highly-doped n-type SiGe crystals for thermoelectric applications;Scientific Reports;2019-03-13

2. Liquid-Phase Epitaxy;Handbook of Crystal Growth;2015

3. Silicon, Germanium and Silicon-Germanium Liquid Phase Epitaxy;Liquid Phase Epitaxy of Electronic, Optical and Optoelectronic Materials;2007-09-04

4. Simulation of dissolution of silicon in an indium solution by spectral methods;Modelling and Simulation in Materials Science and Engineering;2002-08-07

5. Growth and characterization of silicon layers grown by liquid phase epitaxy on cast silicon and silicon sheet material;Thin Solid Films;1996-11

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