Parametric analysis of control parameters in MOCVD
Author:
Publisher
Elsevier BV
Subject
Materials Chemistry,Inorganic Chemistry,Condensed Matter Physics
Reference6 articles.
1. Compositional transients in MOCVD grown III–V heterostructures
2. Evidence for transient composition variations at GaAs/Ga1−xAlxAs heterostructure interfaces prepared by metal-organic chemical vapour deposition
3. Characterization of LP-MOCVD Grown (Al, Ga)As/GaAs Heterostructures by Photoluminescence: Single Heterojunction and Inadvertent Quantum Wells
4. Factors influencing doping control and abrupt metallurgical transitions during atmospheric pressure MOVPE growth of AlGaAs and GaAs
5. A. Melas, Alfa Products, Morton Thiokol Inc., personal communication, 1983 Product Literature.
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