Inverted-vertical OMVPE reactor: design and characterization
Author:
Publisher
Elsevier BV
Subject
Materials Chemistry,Inorganic Chemistry,Condensed Matter Physics
Reference31 articles.
1. W.E. Howe, US Patent No. 3,633,537 (1972).
2. Hydrodynamic description of CVD processes
3. Analysis of Transport Processes in Vertical Cylinder Epitaxy Reactors
4. Heterogeneous kinetics and mass transport in chemical vapour deposition processes
5. AACG West, 7th Conf. on Crystal Growth;Parsons,1983
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