The search for all-hydride MOMBE: examination of trimethylamine alane, trimethylamine gallane, and arsine-Reference-Cited by-同舟云学术

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The search for all-hydride MOMBE: examination of trimethylamine alane, trimethylamine gallane, and arsine

Published:1991-01 Issue:1-4 Volume:107 Page:1068-1069
ISSN:0022-0248
Container-title:Journal of Crystal Growth
language:en
Short-container-title:Journal of Crystal Growth

Author:

Bohling D.A.,Muhr G.T.,Abernathy C.R.,Jordan A.S.,Pearton S.J.,Hobson W.S.

Publisher

Elsevier BV

Subject

Materials Chemistry,Inorganic Chemistry,Condensed Matter Physics

Reference2 articles.

1. MOCVD of AlGaAs/GaAs with novel group III compounds

2. Mechanism of surface selectivity in aluminum chemical vapor deposition

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1. Metal Organic Vapor Phase Epitaxy Chemical Kinetics;Handbook of Crystal Growth;2015

2. (N,N -Dimethylethanamine)Trihydridoaluminum;Inorganic Syntheses;2007-01-05

3. In situ optical monitoring of layer composition in the chemical beam epitaxy of AlGaAs from amine-alane sources;Journal of Materials Science: Materials in Electronics;2003

4. Kinetics;Organometallic Vapor-Phase Epitaxy;1999

5. Ab Initio Characterization of [H3N·BH3]2, [H3N·AlH3]2, and [H3N·GaH3]2;Inorganic Chemistry;1997-11-01

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