Plasma-cracked supply of group V and group VI elements for low temperature epitaxy
Author:
Publisher
Elsevier BV
Subject
Materials Chemistry,Inorganic Chemistry,Condensed Matter Physics
Reference12 articles.
1. Plasma-assisted epitaxy of InAs layers on GaAs
2. Plasma-Assisted Epitaxial Growth of P-Type ZnSe in Nitrogen-Based Plasma
3. A correlation between electron traps and growth processes inn‐GaAs prepared by molecular beam epitaxy
4. The effect of As2and As4molecular beam species on photoluminescence of molecular beam epitaxially grown GaAs
5. Relation between growth conditions and reconstruction on InAs during molecular beam epitaxy using an As2source
Cited by 5 articles. 订阅此论文施引文献 订阅此论文施引文献,注册后可以免费订阅5篇论文的施引文献,订阅后可以查看论文全部施引文献
1. Texture and morphology variations in (In,Ga)2 Se3 and Cu(In,Ga)Se2 thin films grown with various Se source conditions;Progress in Photovoltaics: Research and Applications;2011-11-10
2. Growth of polycrystalline Cu(In,Ga)Se2 thin films using a radio frequency-cracked Se-radical beam source and application for photovoltaic devices;Applied Physics Letters;2007-07-23
3. Preparation of Cu(In1-xGax)Se2 Thin Films and Solar Cells Using a Se-radical Beam Source;MRS Proceedings;2007
4. Generation of atomic group V materials for the p-type doping of wide gap II–VI semiconductors using a novel plasma cracker;Journal of Crystal Growth;1996-04
5. Generation of atomic group V materials for the p-type doping of wide gap II–VI semiconductors using a novel plasma cracker;Selected Topics in Group IV and II–VI Semiconductors;1996
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