Methods for the fabrication of convex corners in anisotropic etching of (100) silicon in aqueous KOH-Reference-Cited by-同舟云学术

Methods for the fabrication of convex corners in anisotropic etching of (100) silicon in aqueous KOH

Published:1990-10 Issue:1-3 Volume:25 Page:9-13
ISSN:0924-4247
Container-title:Sensors and Actuators A: Physical
language:en
Short-container-title:Sensors and Actuators A: Physical

Author:

Offereins H.L.,Kühl K.,Sandmaier H.

Publisher

Elsevier BV

Subject

Electrical and Electronic Engineering,Metals and Alloys,Surfaces, Coatings and Films,Condensed Matter Physics,Instrumentation,Electronic, Optical and Magnetic Materials

Reference8 articles.

1. H. Seidel, L. Csepregi, A. Heuberger, H. Baumgärtner, Anisotropic etching of crystalline silicon in alkaline solutions, I, II, J. Electrochem. Soc., submitted for publication.

2. A study on compensating corner undercutting of <100 > -silicon;Wu;Proc. 4th Int. Conf. Solid-State Sensors and Actuators (Transducers '87), Tokyo, Japan,251987

3. Compensation structures for convex corner machining in silicon;Puers;Sensors and Actuators,1990

4. Monolithisches Kraftsensorfeld;Buser;VDI-Ber. Nr. 677,1988

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