Author:
Vuilleumier R.,Kraiczek K.
Subject
Electrical and Electronic Engineering,Metals and Alloys,Surfaces, Coatings and Films,Condensed Matter Physics,Instrumentation,Electronic, Optical and Magnetic Materials
Reference5 articles.
1. Effect of slit width setting on spectrophotometric measurements;Jiang;Int. Lab.,1981
2. Diode Array Detection in HPLC;Huber,1993
3. Anisotropic etching of silicon;Bean;IEEE Trans. Electron Devices,1978
4. Methods for the fabrication of convex corners in anisotropic etching of (100) silicon in aqueous KOH;Offereins;Sensors and Actuators A,1991
5. Simulation of anisotropic chemical etching of crystalline silicon using a cellular automata model;Than;Sensors and Actuators A,1994
Cited by
4 articles.
订阅此论文施引文献
订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献
1. Variable optofluidic slit aperture;Light: Science & Applications;2016-01
2. Sliding-blade MEMS iris and variable optical attenuator;Journal of Micromechanics and Microengineering;2004-09-15
3. Micromachining of plates in oriented silicon;Journal of Micromechanics and Microengineering;1998-06-01
4. MEMS & MOEMS reliability : waferlevel packaging and low-temperature processing issues;Proceedings of 2005 IEEE/LEOS Workshop on Fibres and Optical Passive Components, 2005.