Author:
Yoshida Y.,Kobayashi Y.,Hayakawa K.,Yukihira K.,Yoshida A.,Ueno H.,Shimura F.,Ambe F.
Subject
Electrical and Electronic Engineering,Condensed Matter Physics,Electronic, Optical and Magnetic Materials
Reference10 articles.
1. Iron and its complexes in silicon
2. In-Beam Mössbauer Study of Interstitial and Substitutional 57Mn/57Fe Jumps in Si
3. H.P. Gunnlaugsson, G. Weyer, M. Dietrich, and the ISOLDE Collaboration, M. Fanciulli, K. Bharuth-Ram, R. Sielemann, Appl. Phys. Lett. 80 (2002) 2657.
4. Y. Yoshida, F. Shimura, in: H.R. Huff, U. Gösele, H. Tsuya (Eds.), Proceedings of the Eighth International Symposium on Silicon Materials Science and Technology, vol. 98–1, 1998, p. 984.
Cited by
25 articles.
订阅此论文施引文献
订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献