FUNDAMENTALS OF CHEMICAL VAPOR DEPOSITION

Author:

Pierson Hugh O.

Publisher

Elsevier

Reference32 articles.

1. Spear, K.E., Thermochemical Modeling of Steady-state CVD Process, Proc. 9th. Int. Conf. on CVD (McD. Robinson et al, Eds.), pp. 81–97, Electrochem. Soc., Pennington NJ 08534(1984)

2. Chemical Vapor Deposition of Inorganic Thin Films;Kern,1978

3. Gokoglu, S.A., Chemical Vapor Deposition Modeling- An Assessment of Current Status, Proc. 11th. Int. Conf. on CVD (K. Spears and G. Cullen, Eds.) pp.1–9, Electrochem. Soc. Pennington, NJ 08534(1990)

4. Vapor Deposition;Powell,1966

5. The CVD of TiB2 from Diborane;Pierson;Thin Solid Films,1980

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