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2. Use of Surfactants for Improved Particle Performance of dHF-Based Cleaning Recipes;Vos;Solid State Phenom.,2000
3. Wettability and Cleaning of Silicon Wafers in Tetramethyl Ammonium Hydroxide-Based Solutions;Jeon,1996
4. Emerging Developments in CMP for Semiconductor Planarization;Fury;Solid State Technol.,1995
5. Post-Tungsten CMP Cleaning: Issues and Solutions;Meyers;Solid State Technol.,1995