The formation of titanium silicides by rapid thermal processing: an XRD and AES study-Reference-Cited by-同舟云学术

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The formation of titanium silicides by rapid thermal processing: an XRD and AES study

Published:1989-08 Issue:3 Volume:7 Page:249-262
ISSN:0168-7336
Container-title:Reactivity of Solids
language:en
Short-container-title:Reactivity of Solids

Author:

Bensch W.,Pamler W.

Publisher

Elsevier BV

Subject

General Engineering

Reference25 articles.

1. Development of the Self-Aligned Titanium Silicide Process for VLSI Applications

2. Self-aligned TiSi2 for bipolar applications

3. Titanium silicidation by halogen lamp annealing

4. Fast radiative processing of titanium silicides under vacuum

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